(Nanowerk News) A new way to deposit thin layers of atoms as a coating onto a substrate material at near room temperatures has been invented at The University of Alabama in Huntsville (UAH), a part of ...
Uniform, conformal thin films have a wide variety of applications in modern technology, including semiconductor microelectronics 1, displays, optical filters, magnetic information storage and ...
Imagine being able to deposit a film of material just a few atomic layers at a time. As impossible as that sounds, atomic layer deposition (ALD) is a reality. In fact, it’s being used in an ...
Review and outlook of atomic layer deposition for nanoscale oxide semiconductor thin film transistor
A group of scientists from Hanyang University has published a report reviewing and discussing the outlook of atomic layer deposition (ALD) based oxide semiconductor thin film transistors (TFTs). The ...
With this collaboration, IME and Picosun will jointly develop innovative ALD and plasma-enhanced ALD (PEALD) processes for novel dielectrics and metals for applications in resistive switching ...
Surface decomposition reactions and growth mechanisms are the key influences on the physicochemical properties of the deposited films. It is therefore essential to fully characterize and understand ...
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