To address the urgent issue of how to manage process variability in the early stages of design creation, Mentor Graphics Corp. today announced its production-proven Calibre Litho-Friendly Design (LPD) ...

ALLENTOWN, Pa. — TEA Systems Corp. introduced Weir PW, a software suite for process control in lithography applications. Using custom models for wafer and field systematic applications, the software ...

At the heart of advancing semiconductor chip technology lies a critical challenge: creating smaller, more efficient electronic components. This challenge is particularly evident in the field of ...

Continued scaling of integrated circuits to smaller dimensions is still a viable way to increase compute power, achieve higher memory cell density, or reduce power consumption. These days, chip makers ...

Over the past few years we’ve seen several impressive projects where people try to manufacture integrated circuits using hobbyist tools. One of the most complex parts of this process is lithography: ...

Experts at the Table: Semiconductor Engineering sat down to discuss extreme ultraviolet (EUV) lithography and other next-generation fab technologies with Jerry Chen, head of global business ...

Imagine a machine so advanced it operates with light invisible to the human eye, etching circuits onto silicon wafers at scales smaller than a virus. This is the world of EUV lithography, a ...

Extreme Ultraviolet (EUV) lithography represents a transformative advancement in semiconductor fabrication, utilising 13.5‐nm wavelength light to achieve remarkably fine feature sizes far below the 10 ...